HT (Q) Lo₂ repono tristique - agentibus et certa repono solutions

Short description:

Et Lo₂ tristique est horizontalis duplex-layer vacuo velit repono cisternina ad reponunt Lo₂, nitrogen, Argon, Naturalis Gas, Carbon Dioxide et aliis Media. In interiore tristique factum est de (XXX) CDVIII / 316L Austenititic Aliquam ferro; In materia est exteriores continens est CCCXLV ipsum ferro laminam vel CCCIV immaculatam ferro secundum ad nationalibus ordinationes secundum diversas user regiones. In fabricare de interiore continens, in user potest etiam eligere ut ad contentionem confortans processus, quod potest salvum facere obsidionem sumptus pro elit.


Product Detail

Technical parametri

Product Tags

Productum commoda

HTQ (V)

HTQ (IV)

● optimum scelerisque proprietatibus:Nostrum products habere optimum scelerisque proprietatibus, quae efficaciter ne calorem translationem et curare meliorem temperatus ordinacione.

● innovative vacuo processus:Nostrum sectionem-ore vacuo technology ensures quod productum est liberum de aliqua aer aut humorem, improving eius altiore perficientur et diuturnitatem.

● Impeccable Piping Ratio:Habemus papfted perfectum limbis ratio ut efficiens et seamless fluxus fluidorum, minimizing aliqua interpellatione vel evadit. Maturus

● anti-corrosio coating:Nostra products adoptare maturescere et reliable anti-corrosio coating, quae providet reliable anti-rubigo praesidium et extendat suum muneris vitae. Amplexus

● Salutis features:Insuper et supra qualitates, nostra products etiam continent amplificata salus features ut fortis constructione et secure caerimonias ut summum salus users.

Features

HTQ (II)

HTQ (I)

● Enhanced Security mensuras:Nostra products instructi ad provecta securitatem features ut biometricae seras, encrypted notitia tradenda et remotis magna elit. Hi mensuras superiores curare maximam praesidium contra alienum accessum et pacem mentis users.

● Simplified user usus:Nos disposito nostra products cum user commodum in mente. Ex intuitive interfaces et user-amica controls ad automated processus et velox setup options, usura nostrum products est facile et simplex.

● Reducere damnum & vastum:Nostra products uti secans-ore technology ad minimize damnum et perditio. Utrum per optimized industria efficientiam, melius materiam utendo vel provectus vigilantia systems, products nostra products auxilium minimize resource vastum et maximize cedat.

● Simplified sustentacionem:Nos intelligere quam magna simplex sustentacionem est ad nostram teloneariorum. Nostra products pluma modularis cogitationes et amovibilibus components ad facile troubleshooting et reparatione. Insuper providere comprehensive sustentationem guidelines et providere opportune auxilium ut lenis operationem et minimize downtime.

Product Application

● Medical Industry:Nostrum products ludere a vitalis partes in repono de liquefaced vapores in medicinae applications ut cryogenic repono in vaccina, sanguinem products et alia temperatus sensitivo medical commeatus. Illa tutum conservationem harum discrimine resources, maintaining eorum potentia et qualitas.

● Machinery Industry:Multi industries confidunt in liquefacta Gas est potentia et frigus machinery. Nostra products providere tutum repono solutions his vapores, ensuring intempestive operationem cum adhaerens ad summum salutem signa.

● eget industria:Liquet vapores late in variis eget processibus ut refrigerationem et calefacere, et sicut rudis materiae ad vestibulum. Nostra products providere certa et imperium elit ut congregem his vapores, ne effluo et minimize facultatem accidentium.

● Food Industry:Liquet Gas adhibetur ad glacians, nova-servatione, carbonation et alia processibus in cibum industria. Nostrum products ensure tutum repono harum vapores, maintaining eorum puritatem et ne contagione, ita servandam quale et novitatem cibi.

● Aerospace industria:In aerospace industria, liquefacta vapores sunt ad propulsionem, pressurization et temperatus imperium of Rockets, satellitum, et elit. Nostrum products providere tutum et agentibus repono solutiones his volatile vapores, cursus maximam salutem in translationem et usum.
Altiore nostri products sunt critica repono solutiones liquefactus vapores in variis industries, cursus salus efficientiam et qualitatem operis.

Fabrica

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  • Specificatio Volumen effective Consilio pressura Operantes pressura Maximum licita opus pressura Minimum Design metallum temperatus Vas genus VIRGA Pondus Thermal Type Static evaporation rate Vacuum signantes Design Service Vita Notam pingere
    MPA MPA MPA / mm Kg / % / D (o₂) Pa Y /
    HT (Q) 10/10 10.0 1.000 <1.0 1.087 -196 φ2166 * MMCDL * (VI) CC ((IV) DCXL) Multi iacuit curva 0.220 0,02 30 Jotun
    HT (Q) 10/16 10.0 1.600 <1.6 1.695 -196 φ2166 * MMCDL * (VI) CC ((V) CCL) Multi iacuit curva 0.220 0,02 30 Jotun
    Htc10 10.0 2.350 <2.35 2.446 -40 φ2166 * MMCDL * (VI) CC (VI) CCCXXX Multi iacuit curva
    HT (Q) 15/10 15.0 1.000 <1.0 1.095 -196 φ2166 * MMCDL * (VII) CDL ((V) CMXXV) Multi iacuit curva 0.175 0,02 30 Jotun
    HT (Q) 15/16 15.0 1.600 <1.6 1.642 -196 φ2166 * MMCDL * (VII) CDL ((VI) DCCL) Multi iacuit curva 0.175 0,02 30 Jotun
    Htc15 10.0 2.350 <2.35 2.424 -40 φ2166 * MMCDL * (VII) CDL ((VIII) C) Multi iacuit curva
    HT (Q) 20/10 20.0 1.000 <1.0 1.047 -196 * (VII) DCCC * MMDCCC * Φ2516 ((VII) CXXV) Multi iacuit curva 0.153 0,02 30 Jotun
    HT (Q) 20/16 20.0 1.600 <1.6 1.636 -196 * (VII) DCCC * MMDCCC * Φ2516 ((VIII) CC) Multi iacuit curva 0.153 0,02 30 Jotun
    Htc20 10.0 2.350 <2.35 2.435 -40 * (VII) DCCC * MMDCCC * Φ2516 (IX) DCCXX Multi iacuit curva
    HT (Q) 30/10 30.0 1.000 <1.0 1.097 -196 * MMDCCC * (X) DCCC Φ2516 ((IX) DCXXX) Multi iacuit curva 0,133 0,02 30 Jotun
    HT (Q) 30/16 30.0 1.600 <1.6 1.729 -196 * MMDCCC * (X) DCCC Φ2516 ((X) CXXX) Multi iacuit curva 0,133 0,02 30 Jotun
    Htc30 10.0 2.350 <2.35 2.412 -40 * MMDCCC * (X) DCCC Φ2516 (XIII) L Multi iacuit curva
    HT (q) 40/10 40.0 1.000 <1.0 1.099 -196 φ3020 * MMMCCC * (X) ((XII) C) Multi iacuit curva 0.115 0,02 30 Jotun
    HT (Q) 40/16 40.0 1.600 <1.6 1.713 -196 φ3020 * MMMCCC * (X) ((XIII) DCCX) Multi iacuit curva 0.115 0,02 30 Jotun
    HT (Q) 50/10 50.0 1.000 <1.0 1.019 -196 φ3020 * MMMCCC * (XII) XXV ((XV) DCCXXX) Multi iacuit curva 0.100 0.03 30 Jotun
    HT (Q) 50/16 50.0 1.600 <1.6 1.643 -196 φ3020 * MMMCCC * (XII) XXV ((XVII) DCCCL) Multi iacuit curva 0.100 0.03 30 Jotun
    Htc50 10.0 2.350 <2.35 2.512 -40 φ3020 * MMMCCC * (XII) XXV (XXI) D Multi iacuit curva
    HT (Q) 60/10 60.0 1.000 <1.0 1.017 -196 φ3020 * MMMCCC * (XIV) XXV ((XX) CCLX) Multi iacuit curva 0.095 0,05 30 Jotun
    HT (Q) 60/16 60.0 1.600 <1.6 1.621 -196 φ3020 * MMMCCC * (XIV) XXV ((XXXI) D) Multi iacuit curva 0.095 0,05 30 Jotun
    HT (Q) 100/10 100.0 1.000 <1.0 1.120 -196 φ3320 * MMMDC * (XIX) D ((XXXV) CCC) Multi iacuit curva 0.070 0,05 30 Jotun
    HT (Q) 100/16 100.0 1.600 <1.6 1.708 -196 φ3320 * MMMDC * (XIX) D ((XL) LXV) Multi iacuit curva 0.070 0,05 30 Jotun
    HT (Q) 150/10 150.0 1.000 <1.0 1.044 -196 φ3820 * (XXII) D (XLIII) CC Multi iacuit curva 0.055 0,05 30 Jotun
    HT (Q) 150/16 150.0 1.600 <1.6 1.629 -196 φ3820 * (XXII) D (L) CC Multi iacuit curva 0.055 0,05 30 Jotun

    Nota:

    I. Super parametri disposito in occursum parametri oxygeni, NITROGENIUM et Argon simul;
    II. Medium potest esse ullum liquefactum Gas, et parametri non repugnat cum mensa values;
    III. In volumine / dimensionum potest esse aliqua valore et potest esse nativus;
    IV. Q stands ad contentionem, C refers to liquido ipsum dioxide repono cisternina;
    V. In tardus parametri potest adeptus ex nostra turba propter productum updates.

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